Document Type



Available under a Creative Commons Attribution Non-Commercial Share Alike 4.0 International Licence



Publication Details

Published in Optics and Lasers in Engineering 47, pp.271-273, 2009.


Microelectromechanical systems (MEMS) behave differently from massive samples. Conventional testing and inspection techniques usually fail at the microscale. Recently there has been an increasing interest in the application of optical techniques for microstructure testing, because they are high-resolution, non-contact, full-field, fast and relatively inexpensive. New interferometric systems, which are suitable for microscopic optical metrology, are of interest for engineering and industrial applications. A modified electronic speckle pattern shearing interferometer (ESPSI) with a very simple shearing device has been designed for metrology applications on the microscale. The shearing device consists of two partially reflective glass plates. The reflection coefficients of the coatings are 0.3 and 0.7 respectively. The distance and the tilt between the two glass plates control the size of the shear. A long working distance microscope objective is attached to the CCD camera to form a field of view variable over several millimetres in width. The suitability of the system for microscopic measurements is demonstrated. The capability of the system for phase-shifting is also demonstrated. The results obtained are promising for future applications of the ESPSI system for testing and characterisation of MEMS.